In this paper, a novel class of pulsed latches of high speed under minimum energy consumption is designed and implemented in 65-nm CMOS technology. This conditional push-pull pulsed latch adopts a push-pull output stage, which is driven by two split paths with a conditional pulse generator. It is implemented in two versions, respectively, without (CP 3 L) and with (CSP 3 L) shareable conditiona...

In this paper, a novel low power pulsed flip-flop (PFF) using self-controllable pass transistor logic is presented. The pulse generation logic comprising of two transistor AND gate is used in the critical path of the design for improved speed and reduced complexity. In the D to Q path inverter is removed and the transistor is replaced with pass transistor logic. The pass transistor is driven by...

This paper presents an improved three-phase PFC power rectifier with a three-phase diode rectifier cascaded four-switch boost converter. Its operating principle contains the operating principle of two conventional three-phase PFC power rectifiers: one switch boost converter type and a two switch boost converter type. The operating characteristics of the four switch boost converter type three-ph...

A novel power supply system that directly couples pulsed high voltage (HV) pulses and pulsed 13.56 MHz radio frequency (rf) has been developed for plasma processes. In this system, the sample holder is connected to both the rf generator and HV modulator. The coupling circuit in the hybrid system is composed of individual matching units, low pass filters, and voltage clamping units. This ensures...

Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching rate, better uniformity, and less structural, electrical or radiation (e.g. vacuum ultraviolet) damage. Pulsed plasmas can also ameliorate unwanted artefacts in etched micro-features such as notching, bowing, micro-trenching ...