Sub-wavelength lithography places a serious limitation on the conventional ”thin mask” approximation of the field immediately behind the patterned mask. This approximation fails to account for the increasingly important topographical effects of the mask or ”thick mask” effects. This approximation of the photomask near-fields results from the direct application of Kirchhoff Boundary Conditions, ...

A preliminary study on the Noh mask test for analysis of recognition of facial expression was performed. The present study was conducted on 15 normal subjects (mean age: 32 years, SD 9.7 years) as the first step to test for the differences between psychiatric patients and normal subjects. Stimuli were created by photographs of 15 Noh masks at different vertical angles. Subjects were given 12 ta...

Recently, a set of generalized gradient-based optical proximity correction (OPC) optimization methods have been developed to solve for the forward and inverse lithography problems under the thin-mask assumption, where the mask is considered a thin 2D object. However, as the critical dimension printed on the wafer shrinks into the subwavelength regime, thick-mask effects become prevalent, and th...