In this work, a nanolayer of titanium nitride which produced by the magnetron sputtering system is synthesized. Moreover the effect of plasma parameters on the electron temperature is studied. Electron temperature has a significant effect on the plasma coating system properties. The results show that, increasing the working pressure and nitrogen ratio in the system causes decreasing electron te...

A complete vector-2D micro-integrated sensors system for magnetic field measurement is proposed. The system consists of a micro-integrated Fluxgate magnetometer with front-end electronic circuitry based on second-harmonic detection. The magnetic core of the sensor is the VITROVAC 6025X deposited over the micro-integrated coils with the RF magnetron sputtering process deposition.

High-quality heteroepitaxial LaNiO3 (LNO) thin films were successfully grown on SrTiO3 (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150–650 ◦C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substr...

The process of magnetron sputtering of dielectric zinc oxide (ZnO) films at a constant current source, was studied. It is demonstrated that this method of dielectric films deposition makes it possible to obtain high-quality coatings and layers that meet the requirements for creating multilayer diffractive optical elements.

For information on CPI products visit our webpage at www.cpii.com/bmd, or contact: CPI Beverly Microwave Division, Telephone: +1 (978) 922-6000 • FAX: +1 (978) 922-8914 • Email: [email protected] Rev. 7/16 A magnetron is a high power microwave oscillator in which the potential energy of an electron cloud near the cathode is converted into r.f. energy in a series of cavity resonators similar...

Mass spectroscopy was used to analyze the energy and composition of the ion flux during high power pulsed magnetron sputtering (HIPIMS/HPPMS) of a Cr target in an industrial deposition system. The ion energy distribution functions were recorded in the time-averaged and time-resolved mode for Ar + , Ar 2+ , Cr + , Cr 2+ , N2 + and N + ions. In the metallic mode the dependence on pulse energy (eq...

tan films with different n2 partial pressure were deposited on 304 stainless steel using the magnetron sputtering method. the effect of gas pressure on the mechanical property, morphology and phase structure of the films is investigated by x-ray diffraction (xrd), atomic force microscopy (afm), microhardness testing, friction coefficient measurements, and wear mechanism study. the xrd results c...