A new chemical deposition method has been developed to prepare photoconducting n-Sb2S3 thin polycrystalline films. The solution composition of the deposition bath was 0.025M potassium antimonyl tartarate, 0.4M triethanolamine, 0.025M thioacetamide, and 5 • 10-7M silicotungstic acid (STA), respectively. The as-deposited and the annealed films were characterized through x-ray diffraction, neutron...