Electron Beam Lithography is a well-established tool suitable for the modification of substrate surface chemistry. It therefore follows that the deposition and self-assembly of nanoparticles on a surface can be directed using this method. This work explores the effect of electron dose on the electron beam lithographic patterning of selfassembled monolayers (SAMs) on gold surfaces. Electron beam...

We present the application of an evolutionary genetic algorithm for the in situ optimization of nanostructures that are prepared by focused electron-beam-induced deposition (FEBID). It allows us to tune the properties of the deposits towards the highest conductivity by using the time gradient of the measured in situ rate of change of conductance as the fitness parameter for the algorithm. The e...

Based on a sample of 1114 flares observed simultaneously in hard X-rays (HXR) by the BATSE instrument and in soft X-rays (SXR) by GOES, we studied several aspects of the Neupert effect and its interpretation in the frame of the electron-beam-driven evaporation model. In particular, we investigated the time differences (∆t) between the maximum of the SXR emission and the end of the HXR emission,...

Based on simultaneous observations of solar flares in hard and soft X-rays we studied several aspects of the Neupert effect. About half of 1114 analyzed events show a timing behavior consistent with the Neupert effect. For these events, a high correlation between the soft X-ray peak flux and the hard X-ray fluence is obtained, being indicative of electron-beam-driven evaporation. However, for a...

In this work, the continuum model for focused electron beam induced deposition (FEBID) is generalized to account for multilayer adsorption processes. Two types of adsorption energies, describing both physisorption and spontaneous chemisorption, are included. Steady state solutions under no diffusion are investigated and compared under a wide range of conditions. The different growth regimes obs...

Focused electron beam induced deposition (FEBID) is a direct beam writing technique for nanoand micro-structures. By proper selection of the precursor gas, which is dissociated in the focus of the electron beam, different functionalities of the resulting deposits can be obtained. This contribution discusses nano-granular FEBID materials. Quite generally, nano-granular metals can be considered a...

We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM ele...

Cu thin films have been deposited on Si (100) substrate by using a non-mass-separated ion beam deposition (IBD) system. The effect of the substrate bias voltage on the properties of the deposited films was investigated using X-ray diffraction, resistivity measurement and field emission scanning electron microscopy. In the case of Cu thin films deposited without bias voltage, a columnar structur...