نتایج جستجو برای: chemical vapor deposition

تعداد نتایج: 477188  

The suitability of three vapor deposition techniques for pore size modification was evaluated using polycarbonate track etched membranes as model supports. A feature scale model was employed to predict the pore geometry after modification and the resulting pure water flux. Physical vapor deposition (PVD) and pulsed plasma-enhanced chemical vapor deposition (PECVD), naturally, form asymmetric na...

A carbon nanotube (CNT) is a miniature cylindrical carbon structure that has hexagonalgraphite molecules attached at the edges. Nanotubes look like a powder or black soot, but they'reactually rolled-up sheets of graphene that form hollow strands with walls that are only one atom thick.Carbon nanotube has been one of the most actively explored materials in recent year(s) due to...

2001
Jason T. Drotar Y.-P. Zhao G.-C. Wang

We examine, using (211)-dimensional Monte Carlo simulations, the roughening behavior of a reemission model for chemical vapor deposition. We find that, for pure first-order reemission, the interface roughens logarithmically with time and that the scaling exponents are, for most sets of conditions, close to the exponents of the Edwards-Wilkinson model (a50, b50, and z52). We compare our results ...

2012
Flávia Pardo Salata NAHSAN Luciana Mendonça da SILVA Eduardo Bastista FRANCO Paula Costa Pinheiro SAMPAIO Luciana Fávaro FRANCISCONI Polliana Mendes Candia SCAFFA Rafael Francisco Lia MONDELLI

Highand low-speed rotary dental handpieces have been used for a long time in restorative dentistry for cavity preparation. However, problems inherent to conventional burs, such as noise, heat and vibration, have led to the development of new dental burs, such as the chemical vapor deposition diamond-coated bur. Its advantages are many, such as less noise, less pain for the patient, precise cutt...

1996
David S. Dandy

Explicit expressions have been derived for momentum and thermal boundary-layer thickness of the laminar, uniform stagnation flows characteristic of highly convective chemical vapor deposition pedestal reactors. Expressions for the velocity and temperature profiles within the boundary layers have also been obtained. The results indicate that, to leading order, the momentum boundary-layer thickne...

2011
Karen K. Gleason William Deen

There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless lowtemperature process, is used to form thin films of polymers on fragile substrates. To improve research efficiency, a new combinatorial iCVD system was fabricated and used to efficiently determine the deposition kinetics for two new po...

1999
Susan L. Cohen Michael Liehr

The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac), has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and ma...

2008
G. D. Yuan W. J. Zhang Y. Yang Y. Q. Li J. X. Wang

Centre Of Super-Diamond and Advanced Films (COSDAF), Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China c Functional Nano & Soft Materials Laboratory (FUNSOM), Soochow University, Suzhou, Jiangsu 215123, China d Laboratory of Optoelectronic Functional Mate...

2014
Örjan Danielsson

ii by using insulation material correctly, a more uniform temperature distribution can be obtained. A model for the growth of SiC is used to predict growth rates at various process parameters. A number of possible factors influencing the growth rate are investigated using this model. The importance of including thermal diffusion and the effect of etching by hydrogen is shown, and the effect of ...

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