Silicon carbide (SiC) is a wide bandgap third-generation semiconductor well suited for harsh environment power electronics, micro and nano electromechanical systems, emerging quantum technology by serving as hosts states via defect centers. The chemical inertness of SiC limits viable etching techniques to plasma-based reactive ion methods; however, these could have significant undesirable effec...

In this report, the micron-long Si nanowires (NWs) array is grown by a metal assisted chemical etching (MACE) process using Ag as the noble metal catalyst in HF/H2O2 solution. These Si NWs are decorated with arbitrary shaped ultrasmall Si nanocrystals (NCs) due to the side wall etching of the Si NWs. The MACE grown samples exhibit strong PL emission in the visible region and quantum confinement...

Silicon nanostructure surface fabricated from metal-assisted etching have been demonstrated as high sensitivity matrix-free laser desorption/ionization mass spectrometry chip. The silicon nanostructure morphology was found to have direct effect to the mass spectrometry ionization efficiency. Creation of different silicon nanostructure morphologies by changing the metal thickness, etching time a...

We use metal-assisted chemical etching (MCE) method to fabricate nanostructured black silicon on the surface of C-Si. The Si-PIN photoelectronic detector based on this type of black silicon shows excellent device performance with a responsivity of 0.57 A/W at 1060 nm. Silicon nanocone arrays can be created using MCE treatment. These modified surfaces show higher light absorptance in the near-in...

Metal assisted chemical etching (MacEtch) is a recently developed anisotropic wet etching method that is capable of producing high aspect ratio semiconductor nanostructures from patterned metal film. In this review article, we highlight the characteristics of MacEtch of silicon (Si) including controllability of the produced sidewall roughness, the inherent high aspect ratio, the weak crystal or...

Polymers are nowadays actively used in numerous applications owing their low cost and optimized structural properties. Besides, the miniaturization of the novel materials down to nano and even atomic scale needs the use of Electron Microscopy techniques both for imaging and structuring abilities. When used for surface modification, electrons and ions allow altering the surface properties toward...