نتایج جستجو برای: semiconductor metal boundary

تعداد نتایج: 405674  

Journal: :Optics express 2011
Myung-Ki Kim Amit M Lakhani Ming C Wu

Many remarkable semiconductor-based nanolaser cavities using metal have been reported in past few years. However, the efficient coupling of these small cavities to waveguides still remains a large challenge. Here, we show highly efficient coupling of a semiconductor-based metal-clad nanolaser cavity operating in the fundamental dielectric cavity mode to a silicon-on-insulator waveguide. By engi...

Journal: :Nano letters 2014
Xing Dai Sen Zhang Zilong Wang Giorgio Adamo Hai Liu Yizhong Huang Christophe Couteau Cesare Soci

We demonstrate an efficient core-shell GaAs/AlGaAs nanowire photodetector operating at room temperature. The design of this nanoscale detector is based on a type-I heterostructure combined with a metal-semiconductor-metal (MSM) radial architecture, in which built-in electric fields at the semiconductor heterointerface and at the metal/semiconductor Schottky contact promote photogenerated charge...

Journal: :Nano letters 2016
Nir Waiskopf Yuval Ben-Shahar Michael Galchenko Inbal Carmel Gilli Moshitzky Hermona Soreq Uri Banin

Semiconductor-metal hybrid nanoparticles manifest efficient light-induced spatial charge separation at the semiconductor-metal interface, as demonstrated by their use for hydrogen generation via water splitting. Here, we pioneer a study of their functionality as efficient photocatalysts for the formation of reactive oxygen species. We observed enhanced photocatalytic activity forming hydrogen p...

2017
Joana L. Lopes Ana C. Estrada Sara Fateixa Marta Ferro Tito Trindade

Graphene-based materials are elective materials for a number of technologies due to their unique properties. Also, semiconductor nanocrystals have been extensively explored due to their size-dependent properties that make them useful for several applications. By coupling both types of materials, new applications are envisaged that explore the synergistic properties in such hybrid nanostructures...

2001
T. Ouisse

The tunnelling lifetime of an electron lying in a p-type orbital localised at a given distance from a semiconductor or a metal is calculated by using Bardeen’s method. It is then shown that even in the absence of broad bands, the hole injection process from semiconductors and metals into polymers should follow a Fowler-Nordheim dependence, provided that the current is not bulk-limited. In the s...

2002
L. J. Brillson I. M. Vitomirov A. Raisanen S. Chang R. E. Viturro P. D. Kirchner G. D. Pettit J. M. Woodall

The dependence of Schottky barrier formation on surface and interface preparation offers several broad avenues for understanding electronic structure and charge transfer at metal/semiconductor junctions. Interface cathodeand photoluminescence measurements reveal that electrically active deep levels form at III-V and II-VI compound semiconductor surfaces and metal interfaces which depend on temp...

2007
Weihua Guan Shibing Long Ming Liu Qi Liu Yuan Hu Zhigang Li Rui Jia

The charge retention characteristics of metal nanocrystal (MNC) and semiconductor nanocrystal (SNC) memory devices are comparatively studied in this paper. A charge retention model is proposed, taking into account the quantum confinement effect, to account for the better retention characteristics of metal nanocrystal memory observed in the experiment. Simulation results are in good agreement wi...

2012
Szu-Hung Chen Wen-Shiang Liao Hsin-Chia Yang Shea-Jue Wang Yue-Gie Liaw Hao Wang Haoshuang Gu Mu-Chun Wang

A three-dimensional (3D) fin-shaped field-effect transistor structure based on III-V metal-oxide-semiconductor field-effect transistor (MOSFET) fabrication has been demonstrated using a submicron GaAs fin as the high-mobility channel. The fin-shaped channel has a thickness-to-width ratio (TFin/WFin) equal to 1. The nano-stacked high-k Al2O3 dielectric was adopted as a gate insulator in forming ...

Journal: :The Journal of Physical Chemistry C 2015

Journal: :Transactions of the Society of Instrument and Control Engineers 1982

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