Hexagonally patterned lysozyme nanoarrays have been assembled on silicon wafers by combining nanosphere lithography and surface silane chemistry using vapor and solution deposition processes. The patterned protein regions extend over cm sized regions, and the size of each island is approximately 120 nm for the solution-prepared template and approximately 60 nm for the vapor-prepared template. A...

A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm later...

A room temperature scanning Hall probe microscope system utilizing GaAs/AlGaAs and bismuth micro-Hall probes was used for magnetic imaging of ferromagnetic domain structures on the surfaces of crystalline thin film garnets and permanent magnets. The Bi micro-Hall probes had dimensions ranging between 0.25 and 2.8 microm2 and were fabricated using a combination of optical lithography and focused...

DPNTM is a versatile technology that leverages Scanning Probe Microscopy for applications in biotechnology, photomask repair, molecular-electronics, nano-electronics and mask-less lithography. The DPN process was augmented for biotechnology applications (genomics, proteomics) through the design, development, prototype fabrication, testing and manufacture of commercial microfluidic systems calle...

The combination of self-assembly (bottom up) and nano-imprint lithography (top down) is an efficient and effective way to record information at the nanoscale by writing. The use of an electron beam for writing is quite a promising strategy; however, the 'paper' on which to save the information is not yet fully realized. Herein, graphene was selected as the thinnest paper for recording informati...

We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We...

Four-point probe characterization is a standard method for studying the electrical properties of solids and thin films. The probe spacing in four-point probe technique has to be reduced to micro-scale to obtain expected surface sensitivity and spatial resolution. Therefore, microscopic four-point probes (M4PPs) need to be combined with some microscopy techniques. Two types of M4PPs systems have...