Abstrad: Recent developments in the techniques used to produce surface layers of oxides and nitrides by reactive sputtering are considered. These techniques have to give films which can be produced onto large-area, low-temperature substrate materials, such as glass and polymer. It is shown that this has led to the adoption of ion-assisted processes. In particular the use of plasmas leaked from ...

This paper is a review on the status of hard coating of various physical vapour deposition (PVD) techniques and compare their properties. The use of hard and wear resistant PVD coatings on cutting tools is now widespread in global manufacturing for reducing production cost and improving productivity, all of which are essential if industry is to remain economically competitive. The review includ...

We describe a sputtering system that can deposit composition spreads in an effectively UHV environment but which does not require the high-throughput paradigm to be compromised by a long pump down each time a target is changed. The system deploys four magnetron sputter guns in a cryoshroud (getter sputtering) which allows elements such as Ti and Zr to be deposited with minimal contamination by ...

ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and 30 min, and on non etched silicon surface. Energy dispersive X-ray (EDX) technique was employed to investigate the elements contents for etched substrates as well as ZnO films, where it is found to be stoichiometric. Su...