In this paper, we explore the quantitative investigation of the high-frequency performance of Gate Electrode Workfunction Engineered (GEWE) Silicon Nanowire (SiNW) MOSFET and compared with Silicon Nanowire MOSFET(SiNW MOSFET) using device simulators: ATLAS and DEVEDIT 3D. Simulation results demonstrate the improved RF performance exhibited by GEWE-SiNW MOSFET over SiNW MOSFET in terms of transc...

In the paper boost converter characteristics at the steady state obtained from SPICE analysis with the use of selected kinds of MOSFET models of various complexity and accuracy are compared. The dependencies of the converter output voltage, the watt-hour efficiency and the MOSFET inner temperature on the frequency and the duty cycle of the MOSFET control signal as well as the converter load res...

The DRAM cells consist of one or several MOSFET devices and the subthreshold leakage current through the MOSFET strongly depends on the temperature variation. Therefore, it is obvious that the leakage of a memory cell is highly related to temperature variation. The temperature of the circuit can be measured indirectly by using leakage sensors which can be applied to various VLSI circuits becaus...

AbstructThe electrical characteristics of modern VLSI and ULSI device structures may be significantly altered by self-heating effects. The device modeling of such structures demands the simultaneous simulation of both the electrical and the thermal device behavior and their mutual interaction. Although, at present, a large number of multi-dimensional device simulators are available, most of the...

The physical dimensions of bulk MOSFETs have been aggressively scaled down and these conventional devices will soon be experiencing limited improvements due to the scaling down. In order to continue performance improvements, new device architectures are needed. As the scaling of MOSFET into sub-100nm regime, SOI and DG-MOSFET are expect to replace traditional bulk MOSFET. These novel MOSFET dev...