Thin oxinitride films of Zn-Sn-O-N and Si-Al-O-N were deposited on glass by reactive magnetron sputtering at various nitrogen-to-oxygen ratios. Nitrogen added to oxygen led to decrease of the surface roughness and increase of oleophobic properties studied by the oil-drop test. The best oleophobity was obtained for Zn-Sn-O-N oxinitride at Zn:Sn=1:1 and N:O=1:2. Improved oleophobic properties wer...

Radar refractivity retrievals can capture near-surface humidity changes, but noisy phase changes of the ground clutter returns limit the accuracy for both klystronand magnetron-based systems. Observations with a C-band (5.6 cm)magnetronweather radar indicate that the correction for phase changes introduced by local oscillator frequency changes leads to refractivity errors no larger than 0.25 N ...

A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working g...

A.B. Mei, R.B. Wilson, D. Li, David G. Cahill, A. Rockett, Jens Birch, Lars Hultman, Joseph E Greene and Ivan Petrov, Elastic constants, Poisson ratios, and the elastic anisotropy of VN(001), (011), and (111) epitaxial layers grown by reactive magnetron sputter deposition, 2014, Journal of Applied Physics, (115), 21, 214908. http://dx.doi.org/10.1063/1.4881817 Copyright: American Institute of P...

Conditions for depositing perovskite-oriented Pb0.92Sr0.08(Zr0.65Ti0.35) O3 thin films on gold by RF magnetron sputtering are investigated. Deposition results were analysed by scanning electron microscopy, X-ray photoelectron spectroscopy and X-ray diffractometry. It was found that the desired perovskite phase can be obtained at a substrate temperature of 300 C, much lower than the typically re...

In a dc-magnetron discharge with argon feed gas, densities of copper atoms in the ground state Cu(S1/2) and metastable state Cu*(D5/2) were measured by resonance absorption technique, using a commercial hollow cathode lamp as light source. The operating conditions were 0.3 14 μbar argon pressure and 10 200 W magnetron discharge power. The deposition rate of copper in a substrate positioned at 1...

ZnO films were coated on the order of micrometer thickness on various substrates using RF magnetron sputtering. Glass, mica and Si were used as amorphous and crystalline substrates to study film growth. X-ray diffraction measurements revealed a self-induced, (002) oriented texture on all substrates. Effects of residual stresses on growth behavior and possible mechanisms of textured crystallizat...

The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). Characteristic for this technique are high energy pulses (a few Joules) of length 50-100 μs that are applied to the target (catho...