We present a comparison of three different technologies for the fabrication of microoptical elements with arbitrary surfaces. We used direct laser writing, binary mask lithography in combination with reactive ion etching, and graytone lithography.

This paper reports the experimental approaches to the fabrication of two-layer integrated phase masks and the fabrication of photonic crystal templates using the phase mask based on holographic lithography technique. The photonic crystal template is formed by exposing photoresist mixtures to five-beam interference patterns generated through the phase mask. The fabricated phase mask consists of ...

The laser-produced plasma is a compact and relatively inexpensive soft x-ray and extremeultraviolet (EUV) source. In this paper we describe a xenon liquid-jet laser-plasma source suitable for EUV lithography and proximity x-ray lithography (PXL). This specific source combines the advantages of the microscopic-liquid-jet target method and inert-gas, high-Z target material. EUV lithography at A ~...

Multi-beam interference (MBI) provides the ability to form a wide range of sub-micron periodic optical-intensity distributions with applications to a variety of areas, including photonic crystals (PCs), nanoelectronics, biomedical structures, optical trapping, metamaterials, and numerous subwavelength structures. Recently, pattern-integrated interference lithography (PIIL) was presented as a ne...

We report a generic approach for targeting proteins into micropatterns by in situ laser lithography. To this end, we have designed a photocleavable oligohistidine peptide for caging tris(nitrilo triacetic acid) (tris-NTA) groups on surfaces by multivalent interactions. Local photofragmentation of the peptide by UV illumination through a photomask or by a confocal laser beam uncages tris-NTA, th...

Wafer-scale arrays of well-ordered Pb(Zr(0.2)Ti(0.8))O3 nanodiscs and nanorings were fabricated on the entire area (10 mm x 10 mm) of the SrRuO3 bottom electrode on an SrTiO3 single-crystal substrate using the laser interference lithography (LIL) process combined with pulsed laser deposition. The shape and size of the nanostructures were controlled by the amount of PZT deposited through the pat...

Three-beam interference lithography represents a technology capable of producing two-dimensional periodic structures for applications such as micro- and nanoelectronics, photonic crystal devices, metamaterial devices, biomedical structures, and subwavelength optical elements. In the present work, a systematic methodology for implementing optimized three-beam interference lithography is presente...

Currently, cylindrical beams with radial or azimuthal polarization are being used successfully for the optical manipulation of micro- and nano-particles as well as in microscopy, lithography, nonlinear optics, materials processing, and telecommunication applications. The creation of these laser beams is carried out using segmented polarizing plates, subwavelength gratings, interference, or ligh...

The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the...