Abstract. We describe and demonstrate an arrow notation for deriving box-spline subdivision schemes. We compare it with the z-transform, matrix, and mask convolution methods of deriving the same. We show how the arrow method provides a useful graphical alternative to the three numerical methods. We demonstrate the properties that can be derived easily using the arrow method: mask, stencils, con...

There are many applications where the shape of objects needs to be encoded, such as CAD, 3D modelling, signature encoding [9], as well as region oriented video coding techniques [1], where the shape information is described by a binary mask having the same values for all the pixels inside the shape. The binary mask indicates the region(s) in which the texture of the object needs to be coded [7]...

An ideal coronagraph with a band-limited image mask can efficiently image off-axis sources while removing identically all of the light from an on-axis source. However, strict mask construction tolerances limit the utility of this technique for directly imaging extrasolar terrestrial planets. We present a variation on the basic band-limited mask design—a family of “notch filter” masks—that mitig...

This study investigates effective image features for characterization of local regions. We propose an extension of higher order local autocorrelation (HLAC) features. The original HLAC features are restricted up to the second order. They are represented by 25 mask patterns. We increase their orders up to eight and extract the extended HLAC features using 223 mask patterns. Large mask patterns a...

©2002, IS&T—The Society for Imaging Science and Technology be difficult to apply conventional color halftoning techniques to high-fidelity color printing. In a blue noise halftoning method, the problems related to Moiré patterns in conventional screen designs are replaced by color image quality issues related to the overlay of blue noise patterns. A number of different schemes have been propose...

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal mask design, the combined simulation has shown that mask distortion due to electron proximity effect play an important role in worsening the optical ...