We analyze a modern-day 65nm MOSFET technology to determine its electrical characteristics and intrinsic ballistic efficiency. Using that information, we then predict the performance of similar devices comprised of different materials, such as high-k gate dielectrics and III-V channel materials. The effects of series resistance are considered. Comparisons are made between the performance of the...

An analytical model for the electric characteristics of ultrathin double-gate and surrounding-gate MOSFETs in strong inversion and accumulation is presented. The analytical solutions to the 1-D simplified Poisson’s equation in both Cartesian and cylindrical coordinates with symmetric boundary conditions are examined. The concentration of the induced inversion charge by the same surface potentia...

We study the positive and negative bias-temperature instabilities (PBTI and NBTI) on the back gate of single-layer double-gated graphene fieldeffect transistors (GFETs). By analyzing the resulting degradation at different stress times and oxide fields we show that there is a significant asymmetry between PBTI and NBTI with respect to their dependences on these parameters. Finally, we compare th...

Abstract— Quantum dot Cellular Automata (QCA) is anticipated to allow for extremely dense nano-scale design and implementation of logic circuit over the Complementary Metal Oxide Semiconductor (CMOS). QCA has been considered as a promising alternative to CMOS technology for its lower power consumption, higher scale integration and higher switching frequency. Moreover, the basic element in QCA i...

We study the bias-temperature instability (BTI) on the back gate of double-gated graphene field-effect transistors (GFETs). The dependence of the resulting degradation on the stress time and oxide field is analyzed. Finally, the results are compared to the ones obtained on the high-k top gate of the same device.