We have grown epitaxial Rhenium (Re) (0001) films on α-Al2O3 (0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 °C and deposition rates below 1 Å/s. The epitaxial Re films are typically composed of terraced hexa...

We investigate the growth of thin Fe layers on MgAl2O4 (001) and MgO substrates using dc magnetron sputtering. The crystal quality deposited is found to be substantially higher as compared grown substrates. effects magnetic electronic transport properties are discussed.

The DLC film was prepared on a nitrile rubber (NBR) elastomer by DC magnetron sputtering (DC-MS), and the sp3 ratio of adjusted changing negative bias voltage applied to substrate. microstructure, composition, tribological properties films deposited NBR substrates were systematically investigated. results reveal that surface can protect reduce roughness NBR. While ranges from 0 V −150 V, conten...

A process for fabricating high-quality Josephson junctions and DC SQUIDs on basis of Nb/Al technology has been developed. DC magnetron sputtering is used for the deposition of the metal layers and the barrier is formed by thermal oxidation of the Al-layer. The junction area of 5 microns x 5 microns is obtained using anodisation. Three types of Josephson tunnel junctions have been prepared: stan...

Nano Al films were prepared on AZ31 magnesium alloy samples by DC magnetron sputtering. The effects of sputtering power the microstructure and corrosion resistance film investigated. results show that surface aluminum is dense polycrystalline state, it oriented along (111) crystal plane. grain size first increases then decreases with increase power. When exceeds 100 W, there no insignificant ef...

Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on total energy cathodes, which means voltage settings do not necessarily match actual output. In this study, we investigated effects and characteristics titanium nitride thin films produced using sputtering. The values were adjusted by varying supplied ca...