نتایج جستجو برای: chemical deposition
تعداد نتایج: 454324 فیلتر نتایج به سال:
Surface properties carbonaceous materials are often modified by chemical deposition in order to expand the range of their applications | 11. However, the exact nature of the chemical deposition process is not completely understood. The layers of deposited material may exhibit a high degree of inhomogeneity., which results in inadequate performance of the modified material in the targeted applic...
the lack of complete understanding of the substrate effects on carbon nanotubes (cnts) growth poses a lot oftechnical challenges. here, we report the direct growth of nanostructures such as the cnts on stainless steel 304and brass substrates using thermal chemical vapor deposition (tcvd) process with c2h2 gas as carbon sourceand hydrogen as supporting gas mixed in ar gas flow. we used an especi...
carbon nanotubes (cnts), nowadays, are one of the important nanomaterials that can be produce with different methods such as chemical vapor deposition (cvd). growing of cnts via cvd method can be influenced by several operating parameters that can affect their quality and quantity. in this article, the effects of inlet gas mixture temperature on cnt’s local growth rate, total production, and le...
Initiated chemical vapor deposition (iCVD) is a novel process capable of producing a range of polymeric and multifunctional nanocoatings. The process utilizes hot filaments to drive gas phase chemistry which enables the deposition of true linear polymers rather than the highly crosslinked organic networks often associated with plasma enhanced CVD. Importantly, the object to be coated remains at...
*Correspondence: Andrew Michelmore, Mawson Institute, Building V, Mawson Lakes Campus, University of South Australia, Mawson Lakes, 5095, SA, Australia e-mail: andrew.michelmore@ unisa.edu.au Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechan...
Plasmaand water-assisted oxide-oxide thermocompression direct bonding for a self-assembly based multichip-to-wafer (MCtW) 3D integration approach was demonstrated. The bonding yields and bonding strengths of the self-assembled chips obtained by the MCtW direct bonding technology were evaluated. In this study, chemical mechanical polish (CMP)-treated oxide formed by plasma-enhanced chemical vapo...
Superhydrophobic and superhydrophilic properties of chemically-modified graphene have been achieved in larger-area vertically aligned few-layer graphene nanosheets (FLGs), prepared on Si (111) substrate by microwave plasma chemical vapor deposition (MPCVD). Furthermore, in order to enhance wettability, silicon wafers with microstructures were fabricated, on which graphene nanosheets were grown ...
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