Production and investigation about nano structures of heterogeneous ZnS/glass thin layer
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Abstract:
ZnS/glass Thinlayer in high vacuum condition and $40$ degree Deposition angle has been produced by resistance evaporated method with $28$ nm thickness. cabin deposition temperature ZnS layer was about $50C$ and substrates were kept at room temperature. The Atomic Force Microscopy (AFM) and XRD analyses are perfectly accomplished for this layer.
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production and investigation about nano structures of heterogeneous zns/glass thin layer
zns/glass thinlayer in high vacuum condition and $40$ degree deposition angle has been produced by resistance evaporated method with $28$ nm thickness. cabin deposition temperature zns layer was about $50c$ and substrates were kept at room temperature. the atomic force microscopy (afm) and xrd analyses are perfectly accomplished for this layer.
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Journal title
volume 7 issue 1
pages 93- 98
publication date 2015-01-01
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