Optical properties of an octadecylphosphonic acid self-assembled monolayer on a silicon wafer
نویسندگان
چکیده
Article history: We report a study of a full Received 2 June 2008 Received in revised form 7 September 2008 Accepted 10 September 2008 Available online 14 September 2008
منابع مشابه
Delivering octadecylphosphonic acid self-assembled monolayers on a Si wafer and other oxide surfaces.
We describe a simple experimental approach for delivering self-assembled monolayers (SAMs) of octadecylphosphonic acid (OPA) on many oxide surfaces using a nonpolar medium with a dielectric constant around 4 (e.g., trichloroethylene). This approach readily results in the formation of full-coverage OPA SAMs on a wide variety of oxide surfaces including cleaved mica, Si wafer, quartz, and aluminu...
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Condensed octadecylphosphonic acid (OPA) dimers, i.e., two OPA molecules combined with the loss of a water molecule, were detected by time-of-flight secondary ion mass spectrometry (TOF-SIMS) on OPA self-assembled monolayers (SAMs) that are only weakly bonded on the native oxide layer of a silicon wafer. In contrast, these condensed dimers were absent on OPA SAMs formed on the oxide layer of an...
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In examination of oxidation of octadecylphosphonic acid (OPA) self-assembled monolayers (SAMs) prepared on the native oxide of a Si wafer upon exposure to UV/ozone (UVO) for up to 5 min, atomic force microscopy studies of the surface elucidated that there were no changes in morphology of the SAMs. Surprisingly, investigations on the same samples of OPA SAMs using time-of-flight secondary ion ma...
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Octadecylphosphonic acid (OPA) forms monolayers on amorphous smooth titania surfaces. The OPA was deposited by immersion in tetrahydrofuran solutions. The process takes place rapidly at 2× 10−4 M OPA, evidence of which is an advancing water contact angle of approx. 100◦ after 10 s of immersion. The advancing water contact angle plateaus at 110± 2◦ after several hours. At lower concentrations (2...
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