Optimization of Urea-EnFET Based on Ta2O5 Layer with Post Annealing

نویسندگان

  • Cheng-En Lue
  • Ting-Chun Yu
  • Chia-Ming Yang
  • Dorota G. Pijanowska
  • Chao-Sung Lai
چکیده

In this study, the urea-enzymatic field effect transistors (EnFETs) were investigated based on pH-ion sensitive field effect transistors (ISFETs) with tantalum pentoxide (Ta(2)O(5)) sensing membranes. In addition, a post N(2) annealing was used to improve the sensing properties. At first, the pH sensitivity, hysteresis, drift, and light induced drift of the ISFETs were evaluated. After the covalent bonding process and urease immobilization, the urea sensitivity of the EnFETs were also investigated and compared with the conventional Si(3)N(4) sensing layer. The ISFETs and EnFETs with annealed Ta(2)O(5) sensing membranes showed the best responses, including the highest pH sensitivity (56.9 mV/pH, from pH 2 to pH 12) and also corresponded to the highest urea sensitivity (61 mV/pC(urea), from 1 mM to 7.5 mM). Besides, the non-ideal factors of pH hysteresis, time drift, and light induced drift of the annealed samples were also lower than the controlled Ta(2)O(5) and Si(3)N(4) sensing membranes.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Atomic layer deposited high-k nanolaminate capacitors

Al2O3–Ta2O5 nanolaminate films were prepared via atomic layer deposition (ALD) on silicon with a single overall composition and thickness, but with a varying number of Al2O3/Ta2O5 bilayers. The composition of the films was roughly 57% Al2O3 and 43% Ta2O5 and the total film thickness was held at 58 nm, while the number of bilayers was varied from 3 to 192 by changing the target bilayer thickness...

متن کامل

DIELECTRIC CHARACTERISTICS AND RELIABILITY TESTS FOR THIN Au-Ta2O5-SiO2-Si STRUCTURES

Au-Ta2O5-SiO2-Si capacitors were studied in order to investigate their dielectric characteristics and reliability. Tantalum pentoxide thin films on Si were prepared by two methods (RF sputtering of Ta in Ar + O2 and thermal oxidation of tantalum layer on Si, with two thicknesses 50 nm and 17 nm). Films were subjected to post deposition oxygen annealing at 900° C for 30 min. The leakage current ...

متن کامل

Optimization of Annealing Process for Totally Printable High-current Superstrate CuInS2 Thin-Film Solar Cells

Planar superstrate CuInS2 (CIS) solar cell devices are fabricated using totally solution-processed deposition methods. A titanium dioxide blocking layer and an In2S3 buffer layer are deposited by the spray pyrolysis method. A CIS2 absorber layer is deposited by the spin coating method using CIS ink prepared by a 1-butylamine solvent-based solution at room temperature. To obtain optimum annealin...

متن کامل

Fabrication and Characterization of Nanoporous Niobia, and Nanotubular Tantala, Titania and Zirconia via Anodization

Valve metals such as titanium (Ti), zirconium (Zr), niobium (Nb) and tantalum (Ta) that confer a stable oxide layer on their surfaces are commonly used as implant materials or alloying elements for titanium-based implants, due to their exceptional high corrosion resistance and excellent biocompatibility. The aim of this study was to investigate the bioactivity of the nanostructures of tantala (...

متن کامل

Development of an Ion Sensitive Field Effect Transistor Based Urea Biosensor with Solid State Reference Systems

Ion sensitive field-effect transistor (ISFET) based urease biosensors with solid state reference systems for single-ended and two-ended differential readout electronics were investigated. The sensing membranes of the biosensors were fabricated with urease immobilized in a conducting polymer-based matrix. The responses of 12.9∼198.1 mV for the urea concentrations of 8∼240 mg/dL reveal that the a...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره 11  شماره 

صفحات  -

تاریخ انتشار 2011