Electrochemical thin film deposition of polypyrrole on different substrates
نویسندگان
چکیده
Polypyrrole is one of the important conductive polymers that are widely used in energy storage systems, biosensors and electronics. The electrochemical synthesis of polypyrrole has advantages of simple process, mass production and low cost. In this study, polypyrrole thin films were deposited on different electrode substrates by cyclovoltammetric (CV), galvanostatic and potentiostatic deposition methods. Results demonstrated that the galvanostatic deposition method could provide higher electrochemical activity for the films. Different electrode materials including gold, glassy carbon and ink-made carbon composite electrodes were investigated for polypyrrole deposition. The conductive films on all substrates exhibited p-type conjugate polymer characteristics. However, the substrate properties had great impact on the stability of the deposited thin film and some composite carbon substrate materials demonstrate the best performance. The mechanism of the instability of polypyrrole was suggested. The study also demonstrates the feasibility of using carbon ink to make composite electrodes for possible applications in energy storage systems and electrochemical sensors. D 2004 Elsevier B.V. All rights reserved.
منابع مشابه
Parametric study on electrochemical deposition of copper nanoparticles on an ultrathin polypyrrole film deposited on a gold film electrode.
Monoshaped and monosized copper nanostructured particles have been prepared by potentiostatic electrochemical deposition on an ultrathin polypyrrole (PPY) film, electrochemically grown on a Si(100) substrate sputter-coated with a thin gold film or gold-film electrode (GFE). The crystal size and the number density of the copper nanocrystals have been examined by varying several deposition parame...
متن کاملSynthesis of Boron-Aluminum Nitride Thin Film by Chemical Vapour Deposition Using Gas Bubbler
Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films ...
متن کاملStudy of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates
Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...
متن کاملOhmic Contact of Cu/Mo and Cu/Ti Thin Layers on Multi-Crystalline Silicon Substrates
Cu-Mo and Cu-Ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. Deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. The effects of process parameters such as film thickness, annealing duration and temp...
متن کاملElectrodeposition and Capacitive Behavior of Films for Electrodes of Electrochemical Supercapacitors
Polypyrrole films were deposited by anodic electropolymerization on stainless steel substrates from aqueous pyrrole solutions containing sodium salicylate and tiron additives. The deposition yield was studied under galvanostatic conditions. The amount of the deposited material was varied by the variation of deposition time at a constant current density. SEM studies showed the formation of porou...
متن کامل