Winter Wheat Cultivars with Temperature-Sensitive Resistance to Wheat streak mosaic virus Do Not Recover from Early-Season Infections
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منابع مشابه
A Dominant Gene for Resistance to Wheat Streak Mosaic Virus in Winter Wheat Line CO960293-2
Wheat streak mosaic (WSM), caused by Wheat streak mosaic virus (WSMV), is a devastating disease in wheat (Triticum aestivum L.) in the Great Plains of North America. Use of resistance is an effective and environmentally sound method to control the disease. In this study, six wheat genotypes were compared for their responses to WSMV infection under growth chamber conditions. The three resistant ...
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Background and Aims: To evaluate the effect of temperature on wheat streak mosaic virus (WSMV) resistance phenotype, through total protein, phenol, and peroxidase activity in bread wheat, a factorial experiment was conducted using Adl-Cross (resistant) and Marvdasht (susceptible) cultivars. Materials and Methods: Results showed that incubation at 32C changed the gene expression for resistance ...
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Temperature is one of the key factors that influence viral disease development in plants. In this study, temperature effect onWheat streak mosaic virus (WSMV) replication and in planta movement was determined using a green fluorescent protein (GFP)-tagged virus in twowinter wheat cultivars. Virus-inoculated plants were first incubated at 10, 15, 20, and 25°C for 21 days, followed by 27°C for 14...
متن کاملEffects of Single and Double Infections of Winter Wheatby Triticum mosaic virus and Wheat streak mosaic virus on Yield Determinants
Byamukama, E., Tatineni, S., Hein, G. L., Graybosch, R. A., Baenziger, P. S., French, R., and Wegulo, S. N. 2012. Effects of single and double infections of winter wheat by Triticum mosaic virus and Wheat streak mosaic virus on yield determinants. Plant Dis. 96:859-864. Triticum mosaic virus (TriMV) is a recently discovered virus infecting wheat (Triticum aestivum) in the Great Plains region of...
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ژورنال
عنوان ژورنال: Plant Disease
سال: 2014
ISSN: 0191-2917,1943-7692
DOI: 10.1094/pdis-04-13-0455-re