Substrate Effect in Electron Beam Lithography

Proximity Effect Corrections in Electron Beam Lithography

We have used a neural network to compute corrections for images written by electron beams to eliminate the proximity effects caused by electron scattering. Iterative methods are effective. but require prohibitively computation time. We have instead trained a neural network to perform equivalent corrections. resulting in a significant speed-up. We have examined hardware implementations using bot...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Electron Beam Lithography for Applications in Nanotechnology

Nanotechnology, apart from being a catch phrase for media and funding, has a serious role for the development of future products in the field of information technology. Specifically, future generations of memory and logic chips depend strongly on the ability of nanolithography. In addition to the promising field of nanoelectronics, optoelectronics as well as photonic devices benefit from the po...

Independent-exposure Method in Electron-beam Lithography