Compared with a-Fe2O3 and ZnxFe3-XO4 Thin Films Grown by Chemical Spray Pyrolysis

Deposition and characterization of SnO2:Sb thin films fabricated by the spray pyrolysis method

In this study, thin films of transparent semiconductor tin oxide doped with antimony impurities on the glass substrates with different concentrations of antimony that have been prepared using spray pyrolysis method. The effects of different concentration of antimony on the structural, optical, and electrical properties of the thin films were investigated. Prepared layers were characterized by X...

Structural and electrical properties of In-doped vanadium oxide thin films prepared by spray pyrolysis

The In-doped vanadium pentoxide nanostructures with different doping levels including 0, 10, 20 and 30 at.% were prepared by the spray pyrolysis technique. The prepared thin films were characterized by the x-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD results revealed that the films were crystalline in tetragonal phase. Increasing the In-doping level made the structure...

Cadmium Oxide Thin Films Deposited by a Simplified Spray Pyrolysis Technique for Optoelectronic Applications

Cadmium oxide thin films were fabricated on glass substrates by a simplified and low cost spray pyrolysis technique at different substrate temperatures. The X-ray diffraction study showed that irrespective of substrate temperature all the films exhibits a preferential orientation along the (1 1 1) plane. The values of crystallite size were found to be in the range 20.72 – 29.6 nm. The perce...

The growth of CuS thin films by Spray Pyrolysis

Thin films of CuS (covellite) were deposited onto TCO (SnO2:F) glass by Spray Pyrolysis (SP) technique. Aqueous and water:alcohol (ethanol, 1-propanol) solutions of copper(II) chloride and thiourea with different Cu/S molar ratio have been used as precursors. The substrate temperature was varied from 185°C to 285°C. The structural and the morphological characterization of the films has been car...

cadmium oxide thin films deposited by a simplified spray pyrolysis technique for optoelectronic applications